SIMS is a vacuum-based technique for measuring the number and identity of atoms at and near the surface of materials, down to a few microns. Spatial resolution is down to the nano-scale, with highly sensitive measurements.
The facility can handle many types of materials including volatile samples that need to be analysed at liquid nitrogen temperatures.
As well as secondary ion mass spectrometry, the facility has a low energy ion scattering system and a time-of-flight SIMS system. This allows measurement of samples across the periodic table, rapidly transferring between techniques.
Their focussed ion beam SIMS can be used for composite, macro-porous and fragile materials as well as the 'slice and view' technique with 3-D reconstruction.
For more details on the facility visit the surface analysis facility webpages.